Process for the chemical beam etching of a substrate

摘要

A process for etching a substrate or an epitaxial layer on a substrate, in which two or more substrate elements react with different supply substances to form different volatile cpds., involves (a) simultaneously producing, in an ultra-high vacuum, chemical jets of the respective supply substances which converge towards the substrate or epitaxial layer; and (b) maintaining the substrate or layer at a temp. which causes evaporation of the resulting reaction products.