发明名称 |
Laser ultrasonics-based material analysis system and method using matched filter processing |
摘要 |
Disclosed herein is an interferometric-based materials analysis system (10) that employs a novel combination of laser beam shaping and pointing techniques, the use of a low cost, rugged, and compact diode laser (22) as a detection laser, and the use of signal processing techniques that compensate for inherent instabilities and short-term drift in the diode laser. A matched filter processing technique is disclosed for processing interferometrically-obtained data points from a target being analyzed. The matched filter technique is shown to be especially useful for detecting and analyzing Lamb modes within thin targets, such as a silicon wafer undergoing a rapid thermal processing cycle. Also disclosed is a method and apparatus for interferometrically monitoring a target to determine, in accordance with predetermined criteria, an occurrence of a period of time that is optimum for obtaining a data point. In response to detecting such a period an impulse source, such as an impulse laser (14), is triggered to launch an elastic wave within the target so that a data point can be obtained. A plurality of data points so obtained are subsequently processed, such as by the matched filter technique, to determine a property of interest of the target. The property of interest may be, by example, the temperature of the target or the metallurgical status of the target.
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申请公布号 |
US5604592(A) |
申请公布日期 |
1997.02.18 |
申请号 |
US19950482782 |
申请日期 |
1995.06.07 |
申请人 |
TEXTRON DEFENSE SYSTEMS, DIVISION OF AVCO CORPORATION |
发明人 |
KOTIDIS, PETROS A.;CUNNINGHAM, JAMES F.;GOZEWSKI, PAUL F.;BORSODY, CHARLES;KLIMEK, DANIEL E.;WOODROFFE, JAIME A. |
分类号 |
G01N29/00;G01N21/17;G01N21/45;G01N29/04;G01N29/07;G01N29/22;G01N29/24;G01N29/32;G01N29/34;G01N29/44;H01S5/022;H01S5/14;(IPC1-7):G01B9/02;G01N21/00 |
主分类号 |
G01N29/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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