| 发明名称 |
METHOD FOR WASHING VACUUM TREATING CHAMBER AND MECHANISM THEREFOR AS WELL AS PRODUCTION OF SEMICONDUCTOR USING THE SAME AND APPARATUS THEREFOR |
| 摘要 |
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| 申请公布号 |
JPH0949071(A) |
申请公布日期 |
1997.02.18 |
| 申请号 |
JP19950205489 |
申请日期 |
1995.08.11 |
| 申请人 |
HITACHI LTD;HITACHI HOKKAI SEMICONDUCTOR LTD |
发明人 |
SHIMIZU AKIO |
| 分类号 |
H05H1/46;C23C14/00;H01L21/265;H01L21/302;H01L21/3065;(IPC1-7):C23C14/00;H01L21/306 |
主分类号 |
H05H1/46 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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