发明名称 Bonded wafer and method of fabrication thereof
摘要 A bonded wafer with a bond junction having low resistivity due to the low level of oxides at the bond junction. A plasma that removes native oxide layers from wafers is exposed to the wafers. The plasma forms a hydrophobic polymer seal on the wafers, inhibiting subsequent native oxide growth upon exposure to air. The polymer seal on the wafers to be bonded are pressed together and the wafers are annealed to form the bonded wafer in a non-oxidizing ambient. The bond junction formed is primarily silicon to silicon and silicon to carbon bonds.
申请公布号 US5603779(A) 申请公布日期 1997.02.18
申请号 US19950443242 申请日期 1995.05.17
申请人 HARRIS CORPORATION 发明人 LINN, JACK H.;BAJOR, GEORGE;ROUSE, GEORGE V.
分类号 H01L21/20;(IPC1-7):H01L21/20 主分类号 H01L21/20
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