PHOTOMASK AND ITS PRODUCTION AS WELL AS EXPOSURE METHOD USING THE PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To make it possible to prevent a multiple-exposure at the time of exposure with a step-and-repeat system while maintaining a high light contrast by a halftone film. SOLUTION: The exposure of a photomask constituted by forming the halftone film 2, light shielding film 3 and resist 4 in this order on a transparent substrate 1 in every area, is adjusted and the resist 4 is removed so as to have a difference in film thickness. A prescribed pattern is formed on the halftone film 2 and the light shielding film 3 by utilizing the difference in the film thickness. The halftone pattern is a pattern to be transferred to the resist on wafer. The light shielding film 3 is formed between the inner edges of the scribing lines for separating the chips from each other and the outer periphery of the photomask.