| 摘要 |
PROBLEM TO BE SOLVED: To surely execute a solvent using stage, such as resistance washing (peeling) stage without requiring the discharge of contaminated solvents outside of the system or subjecting the solvents to a regenerating treatment in the outside by regenerating and recovering the solvents used in the resist washing (peeling) stage, etc., to be executed in production stages for liquid crystal devices, ICs, etc. SOLUTION: The solvents contg. low boiling contamination components and high boiling contamination components are vaporized in an evaporation section A and the high boiling contamination components are separated as still residues. On the other hand, the vapors generated in the evaporation section A are passed through a mist separator 2 and are introduced to a capacitor 3 where the vapors are partly condensed. The condensate is returned as the liquid for mist washing to a mist washing device 2. The vapors failing to be condensed in the condenser 3 are supplied to a rectification section B where the vapors are subjected to rectification and the low b.p. contamination components are separated as fractions. As a result, the refined solvents are recovered and are returned to the solvent using stages, by which the solvents are cyclically used. |
