| 摘要 |
<p>PROBLEM TO BE SOLVED: To form the image of a line-and-space pattern at finer intervals without making the numerical aperture of a projection lens large by providing a device with an original drawing substrate on which an original drawing pattern emitting light by itself is formed and a projection optical system projecting light emitted from the pattern toward a substrate to be exposed. SOLUTION: This device is constituted of a mask 102, the pattern 103 emitting light by itself, the projection lens 104 and the substrate 105. Then, the radiation angleθs of the radiation light beam group 109 radiated from the pattern 103 formed on the mask 102 is distributed within a range set with 0 as a center. However, the angleθs does not depend on the pattern pitch of the pattern 103 on the mask 102 or the wavelengthλof an exposure light beam 110. Then, the light beam among the group 109 whose radiation angle is larger than the angleθs is cut by an aperture 108. Then, the image of the light beam 110 whose radiation angle is smaller than the angleθs is formed on the substrate 105 by the lens 104.</p> |
