| 摘要 |
PROBLEM TO BE SOLVED: To simply form a pattern on a fluorinated polymer using photolithography by exposing the fluorinated polymer film to ultraviolet ray and etching an exposed part with a fluorinated solvent. SOLUTION: The fluorinated polymer film obtained by casting a resin composition containing a polymer having a functional group and having a fluorinated alicyclic structure, a coupling agent and the fluorinated solvent is exposed to ultraviolet ray. Next, the exposed part is etched with the fluorinated solvent. The functional group of the fluorinated polymer is not restricted so far as it can chemically bond with an organic group of the coupling agent, which has a functional group such as carboxyl group. And as the fluorinated polymer, a polymer having a cyclic structure in the main chain is most suitable and preferably contains 20mol% polymerization unit having the cyclic structure per total polymerization unit. Thus the direct pattern forming method by exposure is newly obtained. |
