| 摘要 |
PROBLEM TO BE SOLVED: To selectively analyze existing molecule and functional group without damaging a material by being capable of analyzing the depthwise direction of an organic substance. SOLUTION: A plasma etching unit 8 is coupled to the sample inlet of a preliminary exhaust chamber 4, and a gate valve 7 for introducing or discharging a sample is disposed between the chamber 4 and the unit 8. The unit 8 has an etching tunnel 14 made of an electrode for generating a plasma to etch the sample placed at the center, sample introducing units 16, 17 for introducing the samples, a vacuum exhausting exhaust unit 12, and a sample base 11 for placing a sample holder 10 for holding the sample. The sample is repeatedly moved without exposing with the atmosphere between an analyzing chamber and the unit 8 via the valve 7, and the depth direction of the sample surface is analyzed while etching it. |
