| 摘要 |
PROBLEM TO BE SOLVED: To provide a high sensitive positive photoresist composition excellent in exposure latitude and coefficient of line breadth deviation by the change of exposure. SOLUTION: The positive photoresist composition contains an alkali soluble resin, a quinone azide compound and a compound expressed by a general formula. In the formula, each of R1 -R15 is the same or different and is hydrogen atom, halogen atom, an alkyl group or the like, each of R17 and R18 is hydrogen atom, an alkyl group or an aryl group, Z is -NHSO2 - or -SO2 NH-, Ar is a univalent aromatic group capable of having a substituent group and at least one or more hydroxyl groups are contained in both or one of X and Ar. |
