| 摘要 |
PROBLEM TO BE SOLVED: To easily obtain a fine pattern by consisting essentially of a polyamide acid ester having a specific weight average molecular weight, a photoinitiator and/or a photosensitizer in a photosensitive resin composition. SOLUTION: The photosensitive resin composition consists essentially of the polyamide acid ester 10000-40000 in weight average molecular weight measured by gel permeation chromatography basing on a polystyrene as a reference and having a structure expressed by formulas I, II, III, the photoinitiator and/or the photosensitizer. In formulas I-III, R1 expresses a 4-valent aromatic residue. R2 expresses a 2-valent organic group <=160 in molecular weight (average molecular weight in the case of a mixture of >=2 kinds) and each of R3 and R4 expresses a compound respectively formulas IV and formula V. R5 expresses a (2-6)-valent organic group, R5 expresses H or CH3 group. P is integers of 1-5. Each of (x), (y), (z) is a percentage of the respective structural unit and 0<x, y<100, 0<z<80 and x+y+z=100. |
