发明名称 FORMATION OF SEMICONDUCTOR SCHOTTKY DIODE
摘要 PROBLEM TO BE SOLVED: To obtain a semiconductor Schottky diode exhibiting a low diffusion potential at the time of evaluating electric characteristics while ensuring a good Schottky contact in which the electrical characteristic values can be grasped accurately. SOLUTION: A compound semiconductor single crystal comprising a group II element and a group VI element (e.g. a semiconductor single crystal of ZnSe, ZnS, CdSe, CdS) is coated, on the surface thereof, with a metal layer exhibiting Schottky type contact to form a Schottky electrode of a semiconductor Schottky diode. In such a method for forming a semiconductor Schottky diode, the surface of compound semiconductor single crystal is subjected to etching with a mixed liquid of bromine and methanol before being coated with a metal layer and then it is further subjected to etching with an aqueous solution containing NaOH or KOH.
申请公布号 JPH0945940(A) 申请公布日期 1997.02.14
申请号 JP19950198709 申请日期 1995.08.03
申请人 KOBE STEEL LTD 发明人 OMOTO SEIICHIRO;KAWANAKA TAKEO;OKADA HIROSHI
分类号 C30B29/48;H01L21/3063;H01L29/47;H01L29/872;(IPC1-7):H01L29/872;H01L21/306 主分类号 C30B29/48
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