发明名称 SELF-PATTERNING METHOD
摘要 PROBLEM TO BE SOLVED: To form the films of the patterns which exactly correspond one to one without the misalignment from lens parts formed on one surface side of a transparent substrate on the other surface side of this transparent substrate. SOLUTION: The transparent substrate 1 arranged two-dimensionally with the plural lens parts (r)... on one surface side is prepd. A photoresist film 2 is formed on the other surface side of this transparent substrate 1. This photoresist film 2 is then subjected to exposure via the lens parts (r) from the one surface side of the transparent substrate 1 and is thereafter developed, by which the non-exposed parts exclusive of the exposed parts 2a of the photoresist film are removed. A light shielding film 3 is then formed on the other surface side of the transparent substrate and further, the exposed parts 2a of the photoresist film made to remain are removed, by which the light shielding films of the parts corresponding to the lens parts (r) are removed to form openings 3a.
申请公布号 JPH0943834(A) 申请公布日期 1997.02.14
申请号 JP19950196231 申请日期 1995.08.01
申请人 NIPPON SHEET GLASS CO LTD 发明人 IMAI TOSHIO
分类号 G02B5/00;G02B3/00;G02B5/20;G02F1/1335;G03F7/00;G03F9/00 主分类号 G02B5/00
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