| 摘要 |
PROBLEM TO BE SOLVED: To provide a wafer in which the peak of a fluorescent X-ray generated from a semiconductor substrate itself is not superposed with that of P, Al, Mg, Na for light element analysis of the Al, Na on the surface of the substrate by a total reflection fluorescent X-ray analyzer. SOLUTION: A thin film 2 containing element (F, O, N, C, B, Be, Li, H) having smaller atomic number than Na and having a thickness of 100 angstroms or more is formed on the surface of a board 1. |
