| 摘要 |
An ellipsometry device includes first focusing means (L1), combined with a first optical system (10), for focusing the light beam from said first optical system (10) onto the sample, second focusing means (L2), combined with a second optical system, for focusing the beam reflected by the sample surface onto the input of the second optical system, and optical correction means (PT) for correcting, together with the first and second focusing means (L1, L2), the position of the focused reflected beam so as to reject the interference reflections generated by the surface of the sample opposite the light beam receiving surface, and to obtain a maximum signal level at the photodetector (7).
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