发明名称 Method of manufacturing reference samples for calibrating amount of measured displacement and reference sample, and measuring instrument and calibration method
摘要 PCT No. PCT/JP93/00075 Sec. 371 Date Jul. 18, 1994 Sec. 102(e) Date Jul. 18, 1994 PCT Filed Jan. 21, 1993 PCT Pub. No. WO93/14377 PCT Pub. Date Jul. 22, 1993An object to the present invention is to provide a reference sample for easily and accurately calibrating a region of recesses and projections of several to ten angstroms for the observation of which an inter-atom force microscope displays its performance. The method manufacturing reference samples according to the present invention, wherein an object to be measured and a probe are placed in an opposed state with a minute clearance left between the surface of the former and a free end of the latter. The etching is carried out with an etching agent of an extremely low etching speed to accurately control the speed of etching a stepped portion of a pattern.
申请公布号 US5602323(A) 申请公布日期 1997.02.11
申请号 US19940256613 申请日期 1994.07.18
申请人 OHMI, TADAHIRO 发明人 OHMI, TADAHIRO
分类号 C23F1/00;G01B21/30;G01D21/00;G01N1/00;G01N1/28;G01Q40/02;G01Q60/24;G01Q90/00;(IPC1-7):H01L21/465 主分类号 C23F1/00
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