摘要 |
PCT No. PCT/JP93/00075 Sec. 371 Date Jul. 18, 1994 Sec. 102(e) Date Jul. 18, 1994 PCT Filed Jan. 21, 1993 PCT Pub. No. WO93/14377 PCT Pub. Date Jul. 22, 1993An object to the present invention is to provide a reference sample for easily and accurately calibrating a region of recesses and projections of several to ten angstroms for the observation of which an inter-atom force microscope displays its performance. The method manufacturing reference samples according to the present invention, wherein an object to be measured and a probe are placed in an opposed state with a minute clearance left between the surface of the former and a free end of the latter. The etching is carried out with an etching agent of an extremely low etching speed to accurately control the speed of etching a stepped portion of a pattern.
|