| 摘要 |
A surface position detecting apparatus is suitable for detecting a position of a surface of the substrate supported by a support means in an exposure apparatus. The surface position detecting apparatus comprises a light source, an irradiation optical system for irradiating light from the light source obliquely onto the substrate surface and forming an image of a measurement pattern of a pattern plate on the substrate surface, and a converging optical system for converging light irradiated from the irradiation optical system and then reflected by the substrate surface to re-image the image of the measurement pattern on a photodetector surface. The photodetector can detect the surface position based on the position of pattern image re-imaged on the photodetector surface. The image of the measurement pattern comprises a linear image extending in a predetermined direction. Also, a direction in which the line image of the measurement pattern on the substrate surface is displaced when the substrate is vertically moved is neither parallel nor perpendicular to a longitudinal direction of the measurement pattern image.
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