Method of cleaning substrates

摘要

Method for cleaning substrates, particularly a method for removing soluble contaminants and particulate materials from the substrate surface. According to the method, a substrate is inverted and moved horizontally, while flowing cleaning fluid inclinedly upwardly towards the substrate and oppositely to the moving of the substrate; accoustically vibrating the cleaning fluid and, elevating the flowing cleaning fluid at a point adjacent the substrate surface, such that that the flowing cleaning fluid contacts the substrate surface and forms leading edge and trailing edge menisci between the flowing cleaning fluid and the moving substrate.