PHOTOMASK, MANUFACTURE OF PHOTOMASK, FORMATION OF PATTERN, MANUFACTURE OF SEMICONDUCTOR DEVICE, AND DEVICE FOR DESIGNING MASK PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a photomask which prevents an unnecessary pattern from being transferred by preventing an unnecessary projection image from being formed. SOLUTION: This photomask consists of an area which is translucent to at least exposure light and a transparent area, and the phase differences between lights passing through the translucent area and transparent area is substantially 180 deg., and an auxiliary pattern 5 which is transparent and in phase with a main pattern 4 formed out of the transparent area is arranged in an area wherein the angle of the intersection of two desired sides 34 and 35 of the main pattern 4 or their prolongations is <=180 deg. at a translucent phase shift part 6.