| 摘要 |
PROBLEM TO BE SOLVED: To pattern a transparent electrode by utilizing a light shield film as a mask. SOLUTION: After the light shield film 11a is formed on one surface of a transparent substrate 10, an electric insulating layer 12 is formed on the transparent substrate 10 including the top surface of the light shield film 11a, a transparent electrode layer 13 is filmed on this electric insulating layer 12, and negative photoresist 14 is formed on the transparent electrode layer 13; and then the other surface side (back side) of the transparent substrate 10 is exposed through the light shield film 11a as a mask, the photoresist 14 at an unexposed part is removed to expose the base transparent electrode layer 13 at the unexposed part, and after the exposed transparent electrode layer 13 is etched, the photoresist 14 at the remaining exposed part is removed to form the transparent electrode. |
