发明名称 INSULATED GATE TYPE SEMICONDUCTOR DEVICE AND FABRICATION THEREOF
摘要 PROBLEM TO BE SOLVED: To improve SOA of an insulated gate type semiconductor device by making difficult for a parasitic transistor of an insulated gate type semiconductor device to turn ON. SOLUTION: A parasitic bipolar transistor formed of N<+> emitter region, P base layer and N<-> layer is set difficult to turn ON by providing P<+> semiconductor layer 45 having impurity concentration higher than that of the N' emitter region 44 in such a manner that it overlaps with the end part adjacent to the N<+> emitter region 44 of U type IGBT and in contact with the P base region 43 at the bottom part.
申请公布号 JPH0936362(A) 申请公布日期 1997.02.07
申请号 JP19950185783 申请日期 1995.07.21
申请人 MITSUBISHI ELECTRIC CORP 发明人 TAKAHASHI HIDEKI
分类号 H01L29/78;H01L21/331;H01L29/06;H01L29/10;H01L29/739;(IPC1-7):H01L29/78 主分类号 H01L29/78
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