METHOD FOR WASHING MACHINED SILICON INGOT

摘要

PROBLEM TO BE SOLVED: To prevent an expensive washing liquid from quickly deteriorating and at the same time facilitate liquid control when feeding a machined silicon ingot whose cutting process for forming a wafer is completed to a chemical liquid washing process for washing. SOLUTION: Pressed hot water is ejected from nozzles 12a-12g to a machined silicon ingot 2 whose cutting process for forming a plurality of wafers is completed, the slurry inside a narrow slits in the ingot 2 and in a carbon block 4 is eliminated, and then the ingot 2 is fed to a chemical liquid washing process for washing.