| 摘要 |
PROBLEM TO BE SOLVED: To obtain a black matrix for a color filter which has high transmitted light density in a thin film and causes no problem such defects due to deposition of dust by controlling the intrinsic volume resistance of the black matrix to a specified value or lower. SOLUTION: Carbon black is preferable as a black pigment of a photosensitive resist to be used to form a black matrix for a color filter. By compounding carbon black as a black pigment by >=50wt.% expressed in terms of solid matter to prepare the black matrix having <=10<10> Ωcm intrinsic volume resistance. In order to form a black matrix having high light-shielding property and >=3.0 transmitted light density at <=1.0μm film thickness together with such an intrinsic volume resistance, the compounding ratio of the black pigment in the black resist is required to be maximized within the range causing no problem in the dispersibility, and usually, the conc. of the pigment is preferably 50-80wt.% expressed in terms of solid matter. |
