发明名称 NONVOLATILE SEMICONDUCTOR STORAGE DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To narrow the distributing width of the thresholds of memory cells even when writing is made at a high speed without verification so that readout can also be performed at a high speed. SOLUTION: In an EEPROM having a memory cell array in which N-type wells 2 and 3 are separately provided in a periphery control section and cell array section on a p-type Si substrate 1 and electrically rewritable memory cells constituted by forming floating gates 8a-8d and control gates 9a-9d on the n-type well of the cell array section are arranged in a matrix-like state, the floating gates 8 are composed of Si layers doped with p-type impurities.</p>
申请公布号 JPH0936259(A) 申请公布日期 1997.02.07
申请号 JP19950184285 申请日期 1995.07.20
申请人 TOSHIBA CORP 发明人 SHIRATA RIICHIRO
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 H01L21/8247
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