METHODS FOR DEPOSITION OF MOLYBDENUM SULPHIDE

摘要

An unbalanced magnetron sputter ion plating system (10) has a first magnetron (16) with a first target (18) of metal sulphide (e.g. MoS2) and a second magnetron (20) with a second target (22) of metal (e.g. Titanium). In order to recover water and sulphur impurities from the surfaces of the coating chamber the metal target is energised in a pre-coating ion cleaning operation. Metal atoms getter the impurities and allow for better coatings, especially low friction MoS2 coatings. Apparatus for achieving multi-layer coatings is disclosed. The coatings have low friction, good adhesion, and high hardness.