Aperturenmuster-Flachdruckplatte zur Herstellung einer Schattenmaske und Verfahren zur Herstellung dieser Maske

摘要

An aperture pattern-printing plate used for manufacturing a shadow mask, which comprises a transparent substrate (1), and an emulsion layer (3) which is formed on the transparent substrate (1) and which is opaque at portions (4) corresponding to apertures of the shadow mask and transparent at other portions (5), wherein the emulsion layer (3) is overlaid with at least one of the following a substantially-amorphous, transparent scratch-preventing film (11) obtained by hydrolysis and condensation of metal alcoholate and having a thickness of not more than 1.5 mu m, and a foreign matter-preventing film (12) formed substantially of silicone and having a thickness of not more than 0.5 mu m. The foreign matter-preventing film (12) is formed on the scratch-preventing film (11) if the foreign matter-preventing film (12) and scratch-preventing film (11) are both formed.