| 摘要 |
The present invention provides an improved electrodepositable photoresist composition which includes inorganic extender pigments. The use of these particular extender pigments at a pigment to binder ratio of at least 0.05:1 promotes edge coverage, while not adversely affecting the photosensitivity and/or developability properties of the photoresist into which they are incorporated. Embodiments of this invention encompass negative-acting and positive-acting photoresists, either of which may be cationically or anionically electrodeposited, and which include a sufficient quantity of an inorganic extender pigment such that edge coverage is promoted, while adequate photosensitivity and developability are maintained. |
