发明名称 POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent Generation of abnormal noise as well as oscillation of a device resulting from the eccentric rotation of its polishing mechanism. SOLUTION: On a rotation drive shaft 30 a polishing mechanism 39 is mounted which is provided with a polishing pad 42 on an eccentric shaft 40 rotating integrally with the shaft 30 while thereon a balancer 81 is mounted whose position of the center of gravity is set eccentrically on the opposite side to the eccentric direction of the pad 42 with respect to the axis of the shaft 30. When the shaft 30 is rotated the mechanism 39 and the balancer 81 is eccentrically rotated in an integrated manner to thereby cancel the centrifugal force by the eccentric rotation of the two 39, 81. No lateral dislocation of the shaft 30 caused by the eccentric rotation of the mechanism 39 is therefore generated and no abnormal noise or oscillation of a device caused thereby is also generated.
申请公布号 JPH0929602(A) 申请公布日期 1997.02.04
申请号 JP19950207589 申请日期 1995.07.20
申请人 AMITEC CORP 发明人 KAMI YOSHIHIKO
分类号 B24B21/04;B24B29/00;(IPC1-7):B24B21/04 主分类号 B24B21/04
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