| 摘要 |
<p>A gas distribution apparatus (10) for delivering a gaseous substance to a chamber (12) for processing semiconductor wafers (22). The apparatus (10) includes at least one plenum (46, 48) formed for receiving a gaseous substance, a plenum body (40) mountable to the chamber (12) and having at least one conduit (54, 56) formed therein and a nozzle structure (70) removably mounted to the plenum body (40). The conduit (54, 56) is coupled to the plenum (46, 48) for delivery of the gaseous substance to the plenum (46, 48) and the nozzle structure (70) has a plurality of nozzles (34) coupled to the plenum (40) and configured for injection of the gaseous substance into the chamber (12).</p> |
