发明名称 Anlage und Verfahren zur Halbleiterbauelementherstellung
摘要 Liquid for use in the manufacture of semiconductor devices is degassed by passing it through the apparatus of Figure 5. After going through a heat-exchanger the liquid enters a filter comprising a bundle of 7,000 to 10,000 hollow microfibres made of a hydrophobic material. A vacuum pump lowers the pressure to between 700 and 550 mm Hg. The gas can penetrate the hydrophobic substance, which an aqueous fluid cannot; separation is thus enhanced.
申请公布号 DE19540010(A1) 申请公布日期 1997.01.30
申请号 DE19951040010 申请日期 1995.10.27
申请人 SAMSUNG ELECTRONICS CO. LTD., SUWON, KYUNGKI, KR 发明人 KIM, JANG-HOON, SUWON, KR;JANG, DONG-HEUI, SUWON, KR;KIM, SANG-KAP, SUWON, KR;KIM, JEONG-YEAL, SUWON, KR
分类号 H01L21/027;B01D19/00;G03F7/30;H01L21/02;(IPC1-7):H01L21/306 主分类号 H01L21/027
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