发明名称 P, B CONCENTRATION MEASURING METHOD FOR CVD FILM BY INFRARED ABSORPTION SPECTRAL METHOD, AND CALIBRATION CURVE FORMING STANDARD SAMPLE
摘要 PROBLEM TO BE SOLVED: To measure P, B concentrations in a CVD film without lowering the accuracy even if a standard sample is stocked for a long period by using a calibration curve forming coordinate sample in which a CVD oxide film having high moisture absorbing characteristics is deposited for the calibration curve formation by an infrared absorption spectral method after a BPSG or PS film was deposited on an Si substrate. SOLUTION: After the infrared absorption spectrum 7 of an Si substrate 1 on which a CVD oxide film 6 is deposited, is measured, the infrared absorption spectra 8 of a CVD oxide film 6 or BPSG film 2 or Si substrate 1 in which the film thicknesses, B concentration and P concentration are known are measured, and the infrared absorption spectrum 9 of the film 2 is obtained from the difference of the both. The calibration curve of the thickness of the film 2 is obtained from the thickness of the calibration curve forming standard sample and the intensity of the peak 1 near 1100cm<-1> , the calibration curve of the P concentration of the film 2 is obtained from the P concentration of the standard sample and the intensity of the peak 2 near 1320cm<-1> , and the calibration curve of the film 2 is obtained from the B concentration of the standard sample and the intensity of the peak 2 near 1400cm<-1> . The sample in which the film thickness, P concentration and B concentration are unknown is measured by using the respective curves.
申请公布号 JPH0926392(A) 申请公布日期 1997.01.28
申请号 JP19950174748 申请日期 1995.07.11
申请人 MATSUSHITA ELECTRON CORP 发明人 SHITSUPOU OSAMU
分类号 G01B11/06;G01N1/00;G01N21/01;G01N21/35;H01L21/66;(IPC1-7):G01N21/35 主分类号 G01B11/06
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