发明名称 |
LOW-OXYGEN SILICON GRANULE, ITS PRODUCTION AND PRODUCTION OF SILICON NITRIDE |
摘要 |
PROBLEM TO BE SOLVED: To produce low-oxygen silicon granules capable of efficiently producing silicon nitride having a high ratio ofα-silicon nitride by direct nitriding and to produce silicon nitride using the low-oxygen silicon granules. SOLUTION: Silicon powder having 4-10μm average particle diameter is mixed with an org. binder and granulated and the resultant granules are heated at 1,300-1,400 deg.C for 0.5-5hr in a hydrogen-contg. inert atmosphere freed of nitrogen to produce the objective low-oxygen silicon granules having >=0.5m<2> /g specific surface area, <=0.4wt.% oxygen content and <1wt.% carbon content. The low-oxygen silicon granules are nitrided in a hydrogen-contg. nitrogen atmosphere to produce the objective silicon nitride.
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申请公布号 |
JPH0925111(A) |
申请公布日期 |
1997.01.28 |
申请号 |
JP19950173091 |
申请日期 |
1995.07.10 |
申请人 |
SHIN ETSU CHEM CO LTD |
发明人 |
KUWABARA HARUYOSHI;WATANABE MAKI;KONYA YOSHIHARU |
分类号 |
C01B21/068;C01B33/02;C01B33/023;(IPC1-7):C01B33/02 |
主分类号 |
C01B21/068 |
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地址 |
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