发明名称 SEMICONDUCTOR MEMORY DEVICE, ITS MANUFACTURE AND ITS USAGE METHOD
摘要 PROBLEM TO BE SOLVED: To obtain a semiconductor memory device which realizes a large on-state current while a current is being maintained under a low voltage by a method wherein a conductive layer is formed in such a way that it becomes a Vcc potential in a standby state and that it becomes a GND potential in an active state. SOLUTION: A driver transistor Q1 is provided with one pair of source/drain regions 23a, 23b, with a gate insulating layer and with a gate electrode layer 21a. The pair of source/drain regions 23a, 23b are composed of an n-type diffusion region, and they are arranged by keeping a prescribed distance so as to prescribe a channel region. The gate electrode layer 21a is formed so as to face the channel region by interposing the gate insulating layer. Then, a variable voltage plate(VVP) 1 is installed on the rear side of channels of thin-film transistors to be used as load transistors Q5, Q6. The VVP 1 is connected electrically to a VPP voltage (Vvvp) generation circuit 72. Thereby, the VVP 1 becomes a GND potential in an active state and a Vcc potential in a standby state.
申请公布号 JPH0927558(A) 申请公布日期 1997.01.28
申请号 JP19950174774 申请日期 1995.07.11
申请人 MITSUBISHI ELECTRIC CORP 发明人 MAEDA SHIGENOBU;MAEKAWA SHIGETO;KURIYAMA SACHITADA
分类号 H01L27/10;H01L21/8244;H01L27/11;H01L29/786 主分类号 H01L27/10
代理机构 代理人
主权项
地址