| 摘要 |
<p>In the case of a mask (7) for covering the radially outer region of a disc-shaped substrate surface during a coating process, for example a sputtering or vapour deposition process in vacuo, the mask (7) is produced from an elastic material and designed as a flat plate having at least one essentially circular opening. For the purpose of centring and locking the mask on the substrate (1), in the opening there is provided a concentric, annular surface which takes over the actual masking function and extends in a plane parallel to the plane of the plate and onto which the substrate (1) can be placed with its one side which is to be coated. Provided on the outer wall of the opening at a constant spacing from this surface are clamping pieces which are to extend radially inwards and bear against the other side of the substrate (1). <IMAGE></p> |
