Reactive ion etching of indium tin oxide (ITO),申请号EP19940200108-传众专利搜索

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发明名称	Reactive ion etching of indium tin oxide (ITO)
摘要
申请公布号	EP0608931(B1)	申请公布日期	1997.01.22
申请号	EP19940200108	申请日期	1994.01.18
申请人	PHILIPS ELECTRONICS N.V.	发明人	TSOU, LEN-YUAN
分类号	C01G19/00;C04B41/53;C04B41/91;C23F4/00;G02F1/1343;H01L21/302;H01L21/3065;H01L31/18;(IPC1-7):H01L31/18;C23F1/00	主分类号	C01G19/00
代理机构		代理人
主权项
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