发明名称 |
METHOD FOR TRANSFERRING PATTERNS ON SILICONE LADDER TYPE RESIN AND ETCHING SOLUTION USED IN SUCH METHOD |
摘要 |
A method for transferring patterns on a silicone ladder type resin, which comprises: applying onto a substrate a silicone ladder type resin to be represented by the following general formula (I) (I) (where: R1 denotes a phenyl group or a lower alkyl group, and two R1's may be the same or different kinds; R2 denotes hydrogen atom or a lower alkyl group, and four R2's may be the same or different kinds; and n represents an integer of from 5 to 1,000); drying the thus applied resin layer; thereafter applying onto the resin layer a cresol novolac type positive photo-resist; forming a predetermined pattern in the photo-resist layer; subjecting the photo-resist layer to pretreatment; and finally etching the silicone ladder type resin. An etching liquid for etching a silicone ladder type resin, which comprises an aromatic type solvent.
|
申请公布号 |
CA2010030(C) |
申请公布日期 |
1997.01.21 |
申请号 |
CA19902010030 |
申请日期 |
1990.02.14 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
ADACHI, HIROSHI;ADACHI, ETSUSHI;AIBA, YOSHIKO;HAYASHI, OSAMU |
分类号 |
B05D3/06;B05D7/24;C09K13/06;G03F7/075;G03F7/26;G03F7/40;H01L21/308;(IPC1-7):G03F7/26;G03F7/038;G03F7/32 |
主分类号 |
B05D3/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|