发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a compsn. excellent in developability, having high sensitivity and suitable for use as a positive type resist having satisfactory focus latitude by incorporating an alkali-soluble resin, a specified dissolution accelerator and a 1,2-quinonediazido compd. SOLUTION: An alkali-soluble resin, a dissolution accelerator represented by formula I and/or formula II and a 1,2-quinonediazido compd. are incorporated. In the formulae I, II, each of X1 -X10 is H, 1-6C alkyl, 3-10C cycloalkyl, 1-4C alkoxyl, etc., each of Y1 -Y5 is H, 1-6C alkyl, 3-10C cycloalkyl, etc., R is H, 1-4C alkyl or 6-20C aryl, A is a single bond, 1-4C polymethylene, etc., at least one of X1 -X5 and at least one of X6 -X10 are hydroxyl and at least one of Y1 -Y5 is -CH2 OH.
申请公布号 JPH0922112(A) 申请公布日期 1997.01.21
申请号 JP19950170826 申请日期 1995.07.06
申请人 JAPAN SYNTHETIC RUBBER CO LTD 发明人 INOMATA KATSUMI;AKIYAMA MASAHIRO;OTA TOSHIYUKI;TSUJI AKIRA
分类号 G03F7/004;G03F7/022;G03F7/039;H01L21/027;(IPC1-7):G03F7/004 主分类号 G03F7/004
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