发明名称 QUINONE DIAZIDE-SULFONIC ACID ESTER AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To obtain a compound excellent in balance of properties such as sensitivity, resolving power,γvalue, profile, etc., useful as a photosensitive agent in a photosensitive resin composition due to absense of scam during developing. SOLUTION: This compound of the formula (R is o-quinone diazide-sulfonyl) as a quinone diazide-sulfonic acid ester is obtained by reacting 4,4'-(3,4- dihydroxybenzylidene)-bis(2-t-butyl-5-methylphenol) with o-quinone diazide-sulfonic acid halide in the molar ratio of 1.2 to 2.2 in a solvent (e.g. 1,,4-dioxane) in the presence of a basic catalyst (e.g. trimethylamine) in an amount of 1.05 to 1.3 times the mol of the o-quinone diazide-sulfonic acid halide. The compound of the formula is useful as a photosensitive agent in a positive type photosensitive resin composition especially containing an alkali-soluble novolak resin.
申请公布号 JPH0920750(A) 申请公布日期 1997.01.21
申请号 JP19950173409 申请日期 1995.07.10
申请人 SUMITOMO CHEM CO LTD 发明人 ICHIKAWA KOJI;OZAKI HARUKI
分类号 G03F7/022;C07B61/00;C07C303/28;C07C309/76;(IPC1-7):C07C309/76 主分类号 G03F7/022
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