发明名称 |
DEVICE FOR PRODUCTION SILICON SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a device for producing a silicone single crystal by a MCZ (Magnetic field applied Czochralski) method, capable of preventing an operator from the danger of exposure to a magnetic field without accompanying the enlargement of the device. SOLUTION: In a device for producing a silicon single crystal by a MCZ method, a growth control device 8 for controlling a lifting device is disposed at a place apart from the lifting device only by a prescribed distance so that the strength of a magnetic field just near to the growth control device 8 is <=300 gauss. A monitor camera 7 for observing the growth state of the single crystal is disposed above the window 5a of a growth oven 5, and the monitor camera is communicated with the motor of a growth oven control device to enable the remote control of the lifting device with the growth oven control device. In a test example, the integrated exposure value of the magnetic field just near to the growth oven control device can be reduced up to <20% of the allowable maximum value and thereby enables to continue the extremely safe operation. |
申请公布号 |
JPH0920595(A) |
申请公布日期 |
1997.01.21 |
申请号 |
JP19950191086 |
申请日期 |
1995.07.04 |
申请人 |
SHIN ETSU HANDOTAI CO LTD |
发明人 |
FUSEGAWA IZUMI;HAYASHI TOSHIRO;OTA TOMOHIKO;ARAI MASAYUKI |
分类号 |
C30B15/00;C30B15/26;C30B15/30;C30B29/06;H01L21/208;(IPC1-7):C30B29/06 |
主分类号 |
C30B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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