| 摘要 |
<p>PURPOSE: To provide a method for formation of color filters which do not induce defects in thin films, etc., formed in the upper parts of the color filters and with which good color characteristics are obtainable by forming both flanks at the sectional shape of the color filters to a trapezoidal shape having optimum slopes. CONSTITUTION: This method for formation comprises exposing a photosensitive color resist film 2 via an exposure mask 4, then subjecting the films to development processing, thereby forming the color filters of prescribed patterns. The spacing between the color resist film 2 and the exposure mask 4 is changed by vertically moving an exposure base 1 during the exposure of the color resist film 2, by which the color resist film 2 is exposed with the light of the intensity distribution meeting the change in the spacings. This light intensity distribution is controlled optimum for the color resist film 2.</p> |
