| 摘要 |
PURPOSE: To improve the continuity and overlapping accuracy of a pattern in a direction to be focused when a substrate expands or contracts. CONSTITUTION: When an alignment mark (mark) corresponding to each of cross double-axis directions being formed in advance on a substrate is detected by a microscope 32, a main control part 50 detects the position and the number of marks and calculates the expansion or contracts rate in the cross double-axis directions of the substrate based on the position information of the detected specific mark and the position information in terms of design of the specific mark. Then, the calculated expansion or contracts rate in the direction of each axis is weighted according to the number of marks corresponding to each axial direction of the detected cross double-axis direction and the average value is obtained and the weighted average value of the obtained expansion or contracts rate is set as a magnification correction value. A magnification controller 30 corrects the magnification of a projection optical system via a magnification adjustment mechanism 28 based on the set magnification correction value. |
