发明名称 METHOD FOR MEASURING THICKNESS OF FILM UTILIZING X-RAY DIFFRACTION
摘要 PURPOSE: To readily measure the thickness of a film with accuracy while the film is formed, without preparing any calibration curve by changing the incident angle of X rays radiated upon the film and measuring the intensity of diffracted X rays from a substrate corresponding to the incident angle of the X rays with an X-ray intensity measuring instrument. CONSTITUTION: X rays are radiated onto a film 3 from an X-ray irradiation device 4. When the incident angleαof the radiated X rays is increased from 0 deg., diffracted X rays 6 are generated from a sample due to a diffraction phenomenon and the intensity of the diffracted X rays 6 is measured by means of an X-ray intensity measruing instrument 5. The intensity of the diffracted X rays 6 corresponds to the incident angle of the X rays. Then, by preparing a graph indicating the relation between the incident angle of the X rays and the intensity of the diffracted X rays 6 from a substrate 2, the thickness of the film 3 is found by converting the value of the incident angle of the X rays at which the measured intensity of the diffracted X rays starts to increase from zero into the depth of incidence of the X rays.
申请公布号 JPH0914946(A) 申请公布日期 1997.01.17
申请号 JP19950163325 申请日期 1995.06.29
申请人 NIIGATA ENG CO LTD 发明人 SUGANO YUTAKA
分类号 G01B15/02;(IPC1-7):G01B15/02 主分类号 G01B15/02
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