Improvements in or relating to Magnetic Thin Films

摘要

1,163,010. Magnetic structures. INTERNATIONAL BUSINESS MACHINES CORP. 23 Dec., 1966 [30 Dec., 1965], No. 57615/66. Heading H1H. [Also in Division C7] A thin magnetic film is deposited on a substrate, e.g. by vacuum evaporation, at above 300‹ C. in a non-oxidizing atmosphere in the presence of a magnetic field, and then exposed to an O 2 -containing atmosphere whilst maintaining the temperature above 300‹ C. The film may be of a Ni-Fe alloy containing 77-83% Ni and optionally 3% Co, and may be 900 A thick. The substrate may be glass or metal, e.g. Ag-Cu, and is first cleaned, baked in vacuo, and coated with SiO by vacuum evaporation. The magnetic film may be deposited at 305- 425‹ C. at a pressure of 1À5 x 10-6 Torr in a magnetic field of 30 Oe. The O 2 atmosphere is created by leaking in dry air to a pressure of 2 to 8x 10-5 Torr, with the same temperature and magnetic field. The surface is said to be oxidized.