| 摘要 |
<p>PROBLEM TO BE SOLVED: To remove a chemical compound which chemically reacts with oxygen from a process off-gas by scrubbing the process off-gas using a scrubbing solution consisting of hydrogen peroxide, sulfuric acid, carboxylic acid and water. SOLUTION: A process off-gas is scrubbed using a scrubbing solution consisting of hydrogen peroxide, sulfuric acid, carboxylic acid and water. This scrubbing solution should preferably be composed of 5-40wt.% of hydrogen peroxide, 1-10wt.% of sulfuric acid, 5-50wt.% of carboxylic acid and the rest up to 100wt.% of water, and have the concentration of carboxylic acid as expressed by the formula, (wherein, a=555.6.[H2 SO4 ]+83.46; b=56.92.[H2 SO4 ]-132.5, c=-1.01.[H2 SO4 ]+2.13). Thus the chemical compound which reacts with oxygen is substantially removed from the process off-gas, and in this case, this process is not accompanied by the halogenation of a process gas component. In this process, formic acid, acetic acid or propionic acid is preferably used as the carboxylic acid.</p> |
