| 摘要 |
A projection exposure apparatus including a light source system, an optical integrator for forming a plurality of light source images, and a condenser optical system for illuminating a target illumination surface in a rectangular or circular arc pattern in a multiple manner. The optical integrator has, from a light source side, a first lens group which has a plurality of first lens element groups each consisting of a plurality of first lens elements, and a second lens group which has a plurality of second lens element groups each consisting of a plurality of second lens elements. The second lens elements are arranged in a one-to-one correspondence with the first lens elements, and dimensions of the lens section of the first and second lens element satisfy a predetermined relations.
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