| 摘要 |
PURPOSE: To provide a glass having enough transmittance for visible rays, good heat insulating property, and moreover, good transmissivity for radio waves by forming a multiple oxide film comprising tungsten and specified elements of the IVA group in the Periodical Table on a glass substrate. CONSTITUTION: A multiple oxide film consisting of tungsten and one or more elements of groups IVA, IIIA, VIIB, VIB and VB in the Periodical Table is formed on a glass substrate. For example, Si in the group IVA is selected to form a tungsten multiple oxide film. The glass substrate to be used shows such a color satisfying Y=1.27, x=0.9 and y=0.32 in the chromaticity diagram. The glass substrate is degreased and washed with isopropyl alcohol, washed with pure water and dried by blowing nitrogen. Then the substrate is carried into a sputtering system in which a W-10atm.% Si alloy target as a sputtering target is disposed. The sputtering system is evacuated to 5×10<-6> Torr. After the surface of the target is cleaned with Ar gas, oxygen gas is introduced to form a film under specified pressure. Thus, the multiple oxide film having 90nm film thickness is obtd.
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