| 摘要 |
PURPOSE: To accurately estimate wiring by forming pads in a lattice by using a metal film narrower than the wiring. CONSTITUTION: A test element group(TEG) for estimating electromigration consists of wiring 1 for estimation which is composed of an Al film formed on a silicon substrate via an insulating film like an oxide film, and pads 2 composed of Al films formed on both of the end portions of the wiring 1. The width of a lattice of the pad 2 is at most 6μm, and narrower than the width of the wiring 1 which is about 8μm. When an estimation test such as current application is performed, generation of damage due to electromigration becomes slower than that of the wiring 1, by making the pad 2 narrower than the wiring 1. Thereby the life of the wiring 1 can be accurately estimated.
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