发明名称 SEPARATION EQUIPMENT OF MULTILAYERED SEMICONDUCTOR WAFER AND ITS SEPARATION METHOD
摘要 PURPOSE: To surely separate a multilayered wafer, one by one, without damaging the surface of the wafer, by combining a flat air nozzle with a swing air jet nozzle. CONSTITUTION: A multilayered wafer 1 is put on an elevating stage 6. The surface of a wafer on the uppermost surface of the multilayered wafer 1 is sucked by the suction part 5 of a robot suction nozzle 4. An air flow 9 which collides against a plurality of the wafers of the multilayered wafer is made to blow against the side surface of the multilayered wafer 1 from a flat air nozzle 3. The wafer is separated into blocks of two or three wafers. An air flow 8 is made to blow against the blocks from a swing air jet nozzle 2, thereby surely separating the multilayered wafer.
申请公布号 JPH098095(A) 申请公布日期 1997.01.10
申请号 JP19950155719 申请日期 1995.06.22
申请人 FUJI ELECTRIC CO LTD 发明人 ISHIKAWA KENJI
分类号 B65G59/04;B28D5/00;B65G49/07;H01L21/00;H01L21/677;(IPC1-7):H01L21/68 主分类号 B65G59/04
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