发明名称 METHOD FOR PROCESSING PHOTOSENSTIVE PLANOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a method for processing photosensitive planographic printing plates suitable for processing utilizing an automatic developing machine as development with a safe developer of relatively low pH is possible, the compatibility of developability with image intensity (printing resistance and chemical resistance) is possible and insolubilized matter is hardly generated. SOLUTION: This method for processing the photosensitive planographic printing plates comprises developing the photosensitive planographic printing plate having photosensitive layers contg. (a) a phenol formaldehyde resin having >=90wt.% component having >=3 arom. groups in one molecule and a weight average mol. wt. of >=10,000 and (b) o-naphthoquinone diazide sulfonate of a polyhydroxy compd. having a weight average mol.wt. of >=2,000 with a developer contg. at least one kind of the compds. selected from a group consisting of sacharrides, oximes, phenols and alcohol fluorides and having a pH value of the liquid in a range of 10.0 to 12.7. The photosensitive layer further contains cyclic acid anhydride.
申请公布号 JPH096014(A) 申请公布日期 1997.01.10
申请号 JP19950299635 申请日期 1995.11.17
申请人 FUJI PHOTO FILM CO LTD 发明人 TOYAMA TADAO;NAKANISHI HARUO
分类号 G03F7/004;G03F7/00;G03F7/023;G03F7/32;(IPC1-7):G03F7/32 主分类号 G03F7/004
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