| 摘要 |
PURPOSE: To make it possible to rapidly and cleanly peel a pellicle from a quartz substrate in any place by executing the stripping of a stuck mask protective device from the substrate after immersing the device into hot water. CONSTITUTION: The pellicle adhered to the quartz substrate 7 by an adhesive of a hot melt type is stripped from the substrate after the pellicle is immersed into the hot water at the time of stripping the pellicle. Namely, a pin 4 at the front end of a lever 3 is inserted into jig holes 2 bored at the four circumferences of, for example, a pellicle frame 1 and the top end of the lever 3 is depressed by setting the depressing speed of an instron 6 in the state of applying a block 5 afterward, by which the pellicle is peeled from the quartz substrate 7. The immersion temp. into the hot water is >=40 deg.C, more preferably 50 deg.C, and more particularly preferably 60 deg.C and while there is no particular upper limit, the handling under atm. pressure is generally frequent and, therefore, the immersion temp. is <=100 deg.C or below the destruction temp. of a reticle. |
